
CMOS
Technology for constructing integrated circuits

Technology for constructing integrated circuits
Complementary metal–oxide–semiconductor (CMOS SEE-moss) is a type of metal–oxide–semiconductor field-effect transistor (MOSFET) fabrication process that uses complementary and symmetrical pairs of p-type and n-type MOSFETs for logic functions. CMOS technology is used for constructing integrated circuit (IC) chips, including microprocessors, microcontrollers, memory chips, and other digital logic circuits. CMOS overtook NMOS logic as the dominant MOSFET fabrication process for very large-scale integration (VLSI) chips in the 1980s, replacing earlier transistor–transistor logic (TTL) technology at the same time. CMOS has since remained the standard fabrication process for MOSFET semiconductor devices. As of 2011, 99% of IC chips, including most digital, analog and mixed-signal ICs, were fabricated using CMOS technology. In 1948, John Bardeen and Walter Brattain, the original inventors of transistor technology, patented an insulated-gate transistor (IGFET) with an inversion layer. Bardeen...
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